| 产品编号 | CAS号 | 项目名称规格 | 分子式 | 加入购物车 |
|---|---|---|---|---|
| B919870 | 12184-22-4 | 双(环戊二烯)二氯化钼(IV), 95% Bis(cyclopentadienyl)molybdenum(IV) dichloride, 95% |
C10H10Cl2Mo | |
| F698205 | 1317-33-5 | 小片径少层二硫化钼分散液, 浓度:1mg/ml,溶剂:水,稳定剂:LiOH FewLayers NanoMoS2Suspension, 浓度:1mg/ml,溶剂:水,稳定剂:LiOH |
MoS2 | |
| F698204 | 1317-33-5 | 小片径少层二硫化钼分散液, 浓度:1mg/ml,溶剂:乙醇,稳定剂:LiOH FewLayers NanoMoS2Suspension, 浓度:1mg/ml,溶剂:乙醇,稳定剂:LiOH |
MoS2 | |
| F698203 | 1317-33-5 | 小片径少层二硫化钼分散液, 浓度:5mg/ml,溶剂:水,稳定剂:LiOH FewLayers NanoMoS2Suspension, 浓度:5mg/ml,溶剂:水,稳定剂:LiOH |
MoS2 | |
| F698202 | 1317-33-5 | 小片径少层二硫化钼分散液浓度0.1mg/mL(送原液), 浓度:0.1mg/ml,溶剂:水 FewLayers NanoMoS2Suspension, 浓度:0.1mg/ml,溶剂:水 |
MoS2 | |
| F698201 | 1317-33-5 | 小片径少层二硫化钼分散液浓度0.1mg/mL(送原液), 浓度:0.1mg/ml,溶剂:乙醇 FewLayers NanoMoS2Suspension0.1mg/mL, 浓度:0.1mg/ml,溶剂:乙醇 |
MoS2 | |
| F698206 | 1317-33-5 | 小片径少层二硫化钼粉末(送原液), 片径:0.02-1μm,厚度:1-8nm FewLayersNanoMoS2Powder, 片径:0.02-1μm,厚度:1-8nm |
MoS2 | |
| T698114 | 1317-33-5 | 小片径薄层二硫化钼分散液, 浓度: 0.1mg/ml, 溶剂: 水 Thin Layer Nano MoS2 Dispersion, 浓度: 0.1mg/ml, 溶剂: 水 |
MoS2 | |
| T698113 | 1317-33-5 | 小片径薄层二硫化钼分散液, 浓度: 0.1mg/ml, 溶剂: 乙醇 Thin Layer Nano MoS2 Dispersion, 浓度: 0.1mg/ml, 溶剂: 乙醇 |
MoS2 | |
| T698213 | 1317-33-5 | 小片径薄层二硫化钼分散液浓度1mg/mL, 浓度:1mg/ml,溶剂:水,稳定剂:LiOH Thin LayerNanoMoS2Dispersion, 浓度:1mg/ml,溶剂:水,稳定剂:LiOH |
MoS2 | |
| T698211 | 1317-33-5 | 小片径薄层二硫化钼分散液浓度1mg/mL, 浓度:1mg/ml,溶剂:乙醇,稳定剂:LiOH Thin LayerNanoMoS2Dispersion, 浓度:1mg/ml,溶剂:乙醇,稳定剂:LiOH |
MoS2 | |
| T698210 | 1317-33-5 | 小片径薄层二硫化钼分散液浓度1mg/mL, 浓度:5mg/ml,溶剂:水,稳定剂:LiOH Thin LayerNanoMoS2Dispersion, 浓度:5mg/ml,溶剂:水,稳定剂:LiOH |
MoS2 | |
| M698208 | 1317-33-5 | 机械剥离氧化硅/硅基底单层二硫化钼, 基底尺寸:10mmx10mm MechanicalexfoliationMoS2onSiO2/Si, 基底尺寸:10mmx10mm |
MoS2 | |
| M698207 | 1317-33-5 | 机械剥离蓝宝石基底单层二硫化钼, 基底尺寸:10mmx10mm MechanicalexfoliationMoS2onsapphiresubstrate, 基底尺寸:10mmx10mm |
MoS2 | |
| M836282 | 18868-43-4 | 氧化钼, 99% trace metals basis Molybdenum(IV) oxide, 99% trace metals basis |
MoO2 | |
| M813245 | 10241-05-1 | 氯化钼, 99.5% Molybdenum(V) chloride, 99.5% |
MoCl5 | |
| M836128 | 13478-18-7 | 氯化钼(III), 99.5% trace metals basis Molybdenum(III) chloride, 99.5% trace metals basis |
Cl3Mo | |
| C966205 | 12091-64-4 | 环戊二烯基三羰基钼二聚物, 98% Cyclopentadienylmolybdenum tricarbonyl dimer, 98% |
C16H10Mo2O6 | |
| M888702 | 12058-18-3 | 硒化钼(IV), 99.99% metals basis (metals basis) Molybdenum(IV) selenide, 99.99% metals basis |
MoSe2 | |
| M708247 | 12058-18-3 | 硒化钼(IV), 99.95% metals basis, -150目 Molybdenum(IV) selenide, 99.95% metals basis, -150目 |
MoSe2 |