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产品编号 CAS号 项目名称规格 分子式 加入购物车
I965924 34269-03-9 (2, 2, 6, 6-四甲基-3, 5-庚二酮酸)铟, 98%
Indium(2, 2, 6, 6-tetramethyl-3, 5-heptanedionate), 98%
C33H57InO6
I799559 20661-21-6 Indium hydroxide, 99.8% metals basis
Indium hydroxide, 99.8% metals basis
In(OH)3
I799015 22519-64-8 Indium(III) chloride tetrahydrate, 99.995% metals basis
Indium(III) chloride tetrahydrate, 99.995% metals basis
InCl3·4H2O
I769082 14405-45-9 三(2,4-戊二酮酸)铟(III), ≥99.99% trace metals basis
Indium(III) acetylacetonate, ≥99.99% trace metals basis
C15H21InO6
I836171 14405-45-9 三(2,4-戊二酮酸)铟(III), 98%
Indium(III) acetylacetonate, 98%
C15H21InO6
I913595 7783-52-0 三氟化铟, 99.999% metals basis
Indium(III) fluoride, 99.999% metals basis
F3In
I822392 22519-64-8 三氯化铟 四水合物, 99.99% trace metals basis
Indium(III) chloride tetrahydrate, 99.99% trace metals basis
InCl3·4H2O
I822399 22519-64-8 三氯化铟 四水合物, 99%
Indium(III) chloride tetrahydrate, 99%
InCl3·4H2O
768693 22519-64-8 三氯化铟 四水合物, 99.9% metals basis
Indium(III) chloride tetrahydrate, 99.9% metals basis
InCl3·4H2O
I931326 38218-24-5 异丙醇铟(III), ≥99%, 5% w/v异丙醇溶液
INDIUM(III) ISOPROPOXIDE, ≥99%, 5% w/v异丙醇溶液
C9H21InO3
I888689 7783-52-0 氟化铟, 99.99% metals basis
Indium(III) fluoride, 99.99% metals basis
F3In
I929069 14166-78-0 氟化铟(III) 三水合物, 99%
Indium(III) fluoride trihydrate, 99%
InF3 · 3H2O
I888927 27765-48-6 氟硼酸铟, 35wt.% in H2O
Indium(III) tetrafluoroborate, 35wt.% in H2O
B3F12In
I811803 20661-21-6 氢氧化铟, 99.99% metals basis
Indium hydroxide, 99.99% metals basis
In(OH)3
I875139 1312-43-2 氧化铟, 99.99% metals basis
Indium oxide, 99.99% metals basis
In2O3
I875140 1312-43-2 氧化铟, 99.9% metals basis
Indium oxide, 99.9% metals basis
In2O3
I812064 50926-11-9 氧化铟锡, 1-3μm, ≥99% metals basis
Indium tin oxide, 1-3μm, ≥99% metals basis
In2O3/SnO2
I960577 50926-11-9 氧化铟锡, 20-30nm,99.99% metals basis
Indium tin oxide, 20-30nm,99.99% metals basis
In2O3/SnO2
768444 50926-11-9 氧化铟锡, 99.99% metals basis,≤45μm
Indium tin oxide, 99.99% metals basis,≤45μm
In2O3/SnO2
768443 50926-11-9 氧化铟锡, 99.9% metals basis, 50-300nm
Indium tin oxide, 99.9% metals basis, 50-300nm
In2O3/SnO2
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