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| 别名: | 氟化铵(12125-01-8)和氢氟酸（7664-39-3）等缓冲液的混合物 | ||
|---|---|---|---|
| Cas号: | 物化性质: | ||
| 分子式: | 熔点: | ||
| 分子量: | 沸点: | ||
| EINECS编号: | 密度: | ||
| MDL号: | 储存条件: | 室温 | |
| 技术规格说明书 中文版MSDS 英文版MSDS | |||
| 货号 | 规格 | 可用库存 | 销售价(RMB) | 您的折扣价(RMB) | 数量 | 加入购物车 |
|---|---|---|---|---|---|---|
| B980861-250ml | 10:1 含有表面活性剂 | 上海：现货 山东：- 广东：- 重庆：- 河北：- |
320.00 | 加入购物车 | ||
| B980861-1L | 10:1 含有表面活性剂 | 上海：现货 山东：- 广东：- 重庆：现货 河北：- |
720.00 | 加入购物车 | ||
| B980861-bulk | 10:1 含有表面活性剂 | POA | POA | POA | 价格咨询 | |
| 储存条件: | 室温 |
|---|---|
| 产品描述: | Buffered oxide etchant (BOE) is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF etches silicon dioxide too quickly for good process control and also peels photoresist used in lithographic patterning.Buffered oxide etchant (BOE) 10:1 with surfactant can be potentially used in the etching of titanium carbide, which is used in the fabrication of microelectromechanical systems (MEMS). It may be used in the etching of spin-on-dopant (SOD) for the development of conductor-insulator-conductor tunneling diodes. It may also be used to enhance the surface of fused quartz devices. |
